发明名称 DIRECT PARTICLE BEAM INCLUDED FLUIDIZED POLISHING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a polishing system which can be controlled by generating vacuum and positive pressures for recovering and trapping materials ground by grinding particles colliding thereagainst. SOLUTION: In a manual contact device for the polishing system, a housing has first and second ends facing a polishing surface and an intake port and a plurality of discharge ports are disposed at one end of the housing for passage with a generation source for supplying air. The discharge ports have a fixed interval therebetween different from that with the intake port and a housing cover has the first and second ends at which an opening part is located to contact hard polishing materials and the second end of the housing cover and a plurality of discharge ports are arranged on the straight line to the intake port surrounding the opening part of the housing cover and a pouring port. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003230562(A) 申请公布日期 2003.08.19
申请号 JP20020309712 申请日期 2002.10.24
申请人 ALBA WESLEY METCALFE;CALVIN RON CARRIER 发明人 ALBA WESLEY METCALFE;CALVIN RON CARRIER
分类号 B24C5/02;A61B17/00;A61B17/54;A61G12/00;B24C5/04;B24C7/00;B24C9/00;F16K3/24;F16K3/32;(IPC1-7):A61B17/00 主分类号 B24C5/02
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