发明名称 Method of manufacturing a single electron resistor memory device
摘要 A method of manufacturing a memory device that includes a plurality of cells, each having a first electrode coupled to a first location on semiconductor material, a second electrode coupled to a second location disposed away from the first location on the semiconductor material and a plurality of islands of semiconductor material. The islands are surrounded by an insulator. The islands and the surrounding insulator are formed in pores extending into the semiconductor material between the first and second electrodes. As a result, the memory cells are able to provide consistent, externally observable changes in response to the presence or absence of a single electron on the island.
申请公布号 US6607956(B2) 申请公布日期 2003.08.19
申请号 US20020123579 申请日期 2002.04.15
申请人 MICRON TECHNOLOGY, INC. 发明人 AHN KIE Y.;FORBES LEONARD
分类号 G11C11/34;G11C16/04;H01L29/788;(IPC1-7):H01L21/336 主分类号 G11C11/34
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