发明名称 POWDER-LAYING METHOD AND APPARATUS FOR SEMICONDUCTOR WAFER
摘要 PROBLEM TO BE SOLVED: To uniformly scatter powder for preventing the fusion of semiconductor wafers onto the semiconductor wafers. SOLUTION: When pressurized gas is supplied into a container (6) for accommodating a powdered matter (7) to covey the powdered matter (7) into a housing (5) from the container (6), and the powdered matter (7) is scattered onto a plurality of semiconductor wafers (1) that are arranged in the housing (5), the container (6) is heated for drying the powdered matter (7) and at the same time, the powdered matter (7) is agitated by vibrating the container (6). When the container (6) is heated, moisture set to be a binder for mutually bonding the powdered matter (7) evaporates from the powdered matter (7). At the same time, when vibration is given to the powdered matter (7) by an oscillator (10), the powdered matter (7) is sufficiently agitated, the moisture is fully dried, at the same time, the vibration allows each powdered matter (7) to collide with one another, the aggregated powdered matter (7) is pulverized, and each powdered matter (7) is restored. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003229341(A) 申请公布日期 2003.08.15
申请号 JP20020026110 申请日期 2002.02.01
申请人 SANKEN ELECTRIC CO LTD 发明人 ONOE TAKUO;NAGASHIMA HISAYOSHI
分类号 H01L21/22;H01L21/02;H01L21/225;(IPC1-7):H01L21/02 主分类号 H01L21/22
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