发明名称 MANUFACTURING METHOD OF PHOTOELECTRIC DEVICE AND ELECTRONIC DEVICE, AND PHOTOELECTRIC DEVICE AND ELECTRONIC DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a photoelectric device capable of preventing an element from deteriorating the characteristics by thermal damage by preventing heat radiation or bumping of evaporation source generated when forming electrode, and capable of preventing the element from deteriorating of characteristics caused by the heat increase of the base plate by quickly scattering the heat added to the base plate when forming the electrode. SOLUTION: For the manufacturing method of a photoelectric device on the base plate of which, a light emitting element interposed between a pair of electrodes is formed, one electrode out of the pair of electrodes is formed by changing the film forming speed stepwise. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003229254(A) 申请公布日期 2003.08.15
申请号 JP20020026136 申请日期 2002.02.01
申请人 SEIKO EPSON CORP 发明人 UCHIDA MASAHIRO
分类号 H05B33/10;H01L51/50;H05B33/14;H05B33/26;(IPC1-7):H05B33/10 主分类号 H05B33/10
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