| 摘要 |
PROBLEM TO BE SOLVED: To provide a patterning method hardly being influenced by an error even when the error exists in the real moving distance of a stage for scanning a photomask with respect to a set moving distance, and for performing patterning by using the smaller number of photomasks, and to provide an exposure device for the same. SOLUTION: In manufacturing a master used for the transfer of a magnetic pattern on a magnetic storage medium, the photomask used for the exposure of a resist on an Si substrate as a substrate of the master consists of a photomask for an index sector and a photomask for a non index. The photomask is replaced and exposed corresponding to the rotating angle of the stage holding the Si substrate of the exposure device for exposing the photomask. The moving mechanism of the exposure equipment for the Si substrate has functions for movement and rotation in directions of X and Y. COPYRIGHT: (C)2003,JPO
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