| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To obtain a colloidal silica having improved polishing speed and produced by using a tetraalkoxysilane solution as a raw material. <P>SOLUTION: This colloidal silica for polishing is produced by adjusting the pH of a colloidal silica produced from a tetraalkoxysilane e.g. by hydrolysis to 7-11.5 by the addition of one or more kinds of alkaline substances selected from ammonia, an amine, quaternary ammonium hydroxide, sodium hydroxide, potassium hydroxide and lithium hydroxide to the colloidal silica and thermally aging the product at 50-300°C. <P>COPYRIGHT: (C)2003,JPO</p> |
