| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for patterning a photomask which is hardly affected by errors of stage movement even when the real amount of stage movement for scanning the photomask has errors with respect to the set amount of movement. SOLUTION: In manufacturing a master disk used for transferring a magnetic pattern to a magnetic storage medium, a pattern for exposing a resist on an Si substrate which is a master disk substrate is constituted of a plurality of photomasks, and each photomask pattern is constituted of a sector unit. The pattern of each photomask is divided by a sector unit in theθdirection with respect to the center of the master disk, and by a circular arc having the center of the master disk as its origin in the R direction. Since a servo pattern present in one photomask is set by a sector unit, even when the photomask is shifted in position, its influence is hardly felt. COPYRIGHT: (C)2003,JPO
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