发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent warpages or damages of an extremely thin finished semiconductor wafer as reduction in the mechanical strength of the extremely thin finished semiconductor wafer can be suppressed by a lattice-shaped rib, and to manufacture an extremely thin semiconductor chip by dicing a scribe line and the rib as a chip of the extremely thin finished semiconductor wafer is thin in thickness. SOLUTION: A surface 28 to be ground of a thin finished semiconductor wafer 27 is dry-etched by using a mask 29 composed of a resist, and a rib 30 is formed corresponding to a scribe line 24 by leaving the thickness of a substrate 20 behind, and a cavity 31 corresponding to a chip 23 is recessed so as to encircle the cavity with the rib 30. At a dicing step, the scribing line 24 of an extremely thin finished semiconductor wafer 33 is cut off by a diamond blade 38 to cut off the rib 30 to segmentalize the extremely thin semiconductor chip 39. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003229381(A) 申请公布日期 2003.08.15
申请号 JP20020027331 申请日期 2002.02.04
申请人 HITACHI LTD;RENESAS EASTERN JAPAN SEMICONDUCTOR INC 发明人 MATSUZAKI SAKAE
分类号 H01L21/301;(IPC1-7):H01L21/301 主分类号 H01L21/301
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