发明名称 |
METHOD OF MANUFACTURING STRUCTURE SUPPORT, STRUCTURE SUPPORT, AND ELECTRON BEAM DEVICE HAVING THIS STRUCTURE SUPPORT |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a structure support for highly accurately and easily forming an electrode of a spacer. SOLUTION: This manufacturing method includes a first process of forming a low resistance film 1020c having a prescribed resistance value on the whole surface of a spacer base board 1020a composed of first and second surfaces having a prescribed surface different in the thickness, and a second process of removing a low resistance film 1020c formed on the first surface by shaving off the first surface (a projecting part 1020d) by the prescribed thickness by polishing (grinding) or cutting. COPYRIGHT: (C)2003,JPO
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申请公布号 |
JP2003229057(A) |
申请公布日期 |
2003.08.15 |
申请号 |
JP20020023557 |
申请日期 |
2002.01.31 |
申请人 |
CANON INC |
发明人 |
TANAKA TOSHIMITSU;HAYAMA AKIRA;SHIMIZU KOJI;FUSHIMI MASAHIRO |
分类号 |
H01J9/24;H01J29/87;H01J31/12;(IPC1-7):H01J9/24 |
主分类号 |
H01J9/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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