发明名称 METHOD FOR MANUFACTURING MICROLENS AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a liquid crystal device which has no variation of lens characteristics in the case of being provided with microlenses manufactured via an etching step and with which uniform luminance and contrast are obtained over the full display region. <P>SOLUTION: Alignment marks 60 are formed on a base substrate 2a and a photoresist 61 is formed on the base substrate 2a. The photoresist is made to selectively remain by patterning. The selectively remaining photoresist is heated and a surface shape of the photoresist is smoothened by thermal deformation. Subsequently the base substrate 2a with the photoresist formed is etched and the microlenses are formed on the base substrate 2a while the photoresist is removed. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003227905(A) 申请公布日期 2003.08.15
申请号 JP20020356780 申请日期 2002.12.09
申请人 SEIKO EPSON CORP 发明人 INOUE TAKESHI
分类号 G02F1/1335;G02B3/00 主分类号 G02F1/1335
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