MgO VAPOR DEPOSITION MATERIAL AND PRODUCTION METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide an electron beam vapor deposition method in which splashes are hard to occur even on vapor deposition by, and the film properties of an MgO film to be deposited is improved.

SOLUTION: The vapor deposition material consists of polycrystals having an MgO purity of ≥99.0% and a relative density of ≥90.0%, and having a phosphorus P content of 0.01 to 30 ppm.

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