| 摘要 |
PROBLEM TO BE SOLVED: To provide a continuous vapor deposition system by which an organic EL layer having a multilayer structure is continuously deposited. SOLUTION: In the vapor deposition system, a vapor deposition source is constituted of a cylindrical body, provided with a high frequency coil for heating which is wound around the outer circumference and a heat generating body generating heat induced by the high frequency coil inside, and a material supply pipe connected to a material supply apparatus for continuously supplying a granular or the like material with an inert gas or a reactive gas to the cylindrical body. The heat generating body is provided with a proper interval in the cylindrical body. COPYRIGHT: (C)2003,JPO
|
