发明名称 BORON PHOSPHIDE BASED SEMICONDUCTOR ELEMENT, ITS MANUFACTURING METHOD AND LIGHT EMITTING DIODE
摘要 <P>PROBLEM TO BE SOLVED: To provide a technical means for obtaining an active layer having uniform indium composition when an active layer composed of group III nitride semiconductor crystal containing indium which is expressed by a general formula AlQGaRInYN (where 0&le;Q<1, 0&le;R<1, 0<Y&le;1 and Q+R+Y=1) is formed on a boron phosphide based semiconductor crystal layer. <P>SOLUTION: An intermediate layer composed of III-V compound semiconductor is formed between a boron phosphide based semiconductor crystal layer and the active layer. The semiconductor has indium composition which is at most 1/2 of indium composition of the group III nitride semiconductor crystal layer forming the active layer. The intermediate layer is constituted from a polycrystal layer containing crystals different in a crystallinity. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003229601(A) 申请公布日期 2003.08.15
申请号 JP20020027869 申请日期 2002.02.05
申请人 SHOWA DENKO KK 发明人 UDAGAWA TAKASHI
分类号 H01L33/12;H01L33/16;H01L33/32;H01L33/34;H01L33/40 主分类号 H01L33/12
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