发明名称 REMOTE PLASMA TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To decrease damages to a substrate and damages to a substrate stage with respect to different plasma and further to enhance treatment efficiency with respect to the different plasma in remote plasma treatment in which a plasma part for exciting gas by the use of plasma is separated from a treatment part for reacting and treating by the use of gas excited by the plasma. SOLUTION: A remote plasma treatment apparatus is constituted by a plasma chamber composed of an insulating material and a substrate or a substrate stage disposed at a position away at a constant distance from this plasma chamber. The substrate stage containing a heater can be moved vertically, and the distance from the plasma is varied according to the kind of plasma. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003229371(A) 申请公布日期 2003.08.15
申请号 JP20020066108 申请日期 2002.02.04
申请人 CRYSTAGE CO LTD 发明人 MURATA YASUAKI
分类号 C23C16/44;C23C16/505;H01L21/205;H01L21/31;(IPC1-7):H01L21/205 主分类号 C23C16/44
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