发明名称 |
MANUFACTURING METHOD FOR PDP GLASS SUBSTRATE AND PDP |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for a PDP glass substrate capable of managing a height of a partition wall with high accuracy though a production process can be simplified. SOLUTION: By etching the glass substrate in a covering state of a part of the glass substrate by an etching treatment liquid mainly consisting of hydrofluoric acid, the partition wall or an electrode pattern groove is formed. COPYRIGHT: (C)2003,JPO
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申请公布号 |
JP2003229048(A) |
申请公布日期 |
2003.08.15 |
申请号 |
JP20020026149 |
申请日期 |
2002.02.01 |
申请人 |
NISHIYAMA STAINLESS CHEM KK |
发明人 |
NISHIYAMA TOSHIHIRO |
分类号 |
C03C15/00;H01J9/02;H01J11/22;H01J11/34;H01J11/36;(IPC1-7):H01J9/02;H01J11/02 |
主分类号 |
C03C15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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