发明名称 SUBSTRATE PROCESSING APPARATUS OF TRANSFER TYPE
摘要 <p>Chemical contamination at the receiving unit on the upstream side is prevented even if chemical discharge is started in a chemical processing unit on the downstream side in the stage where a substrate (10) passes through the outlet port of a chemical avoiding unit (30). The chemical avoiding unit (30) is partitioned into chambers (33a, 33b, 33c) arranged in the direction of the substrate transfer by at least one partition (32a, 32b). At least one chamber (33b) except the chamber (33a) at the end of the upstream side in the chemical avoiding unit (30) is brought into a negative-pressure state. The pressure of the chamber (33a) is controlled at a normal or positive value. The positions of the partitions are determined so that the trailing end of the substrate (10) may come out of the chamber (33a) when the leading end of the substrate (10) reaches the chemical discharge starting point in the chemical processing unit on the downstream side. Preferable, the positions of the partitions are determined so that the trailing end of the substrate enter the chamber (33c) at the end of the downstream side in the chemical avoiding unit (30) when the when the leading end of the substrate (10) reaches the chemical discharge starting point.</p>
申请公布号 WO2003066486(P1) 申请公布日期 2003.08.14
申请号 JP2002000906 申请日期 2002.02.04
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