发明名称 METHOD FOR THERMALLY TREATING SUBSTRATES
摘要 To increase the temperature homogeneity on the surface of a substrate that is to be thermally treated, a method for thermally treating substrates is provided, according to which the substrate is heated by several separately controllable heating elements. A desired-value profile is predefined for each of said heating elements. The method comprises the following steps: locally-analysed measurement of the temperature of the surface of the substrate that faces away from the heating elements, during the thermal treatment; determination of the temperature inhomogeneities occurring on the substrate surface; definition of new desired-value profiles based on said temperature inhomogeneities; and preparation of the new desired-value profiles for subsequent treatments.
申请公布号 KR20030067695(A) 申请公布日期 2003.08.14
申请号 KR20037007251 申请日期 2003.05.29
申请人 发明人
分类号 H01L21/027;H05B3/00;H01L21/00;H01L21/02 主分类号 H01L21/027
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