摘要 |
Chemically amplified photoresist compositions comprising, a a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid and b a compound of the formula Ia, Ib, IIa, IIb, IIIa, IIIb, Iva, Ivb, Va, Vb or VIa, wherein n is 1 or 2 m is 0 or 1 X0 is -[CH2]h-X or -CH=CH2 h is 2, 3, 4, 5 or 6 R1 when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl R1, when n is 2, is for example optionally substituted phenylene or naphthylene R2 for example has one of the meanings of R1 X is for example -OR20, -NR21R22, -SR23 X' is -X1-A3-X2- X1 and X2 are for example -O-, -S- or a direct bond A3 is e.g. phenylene R3 has for example one of the meanings given for R1 R4 has for example one of the meaning given for R2 R5 and R6 e.g. are hydrogen G i.a. is -S- or -O- R7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for ex­ample phenylene R8 and R9 e.g. are C1-C18alkyl R10 has one of the meanings given for R7 R11 i.a. is C1-C18alkyl R12, R13, R14, R15 R16, R17 and R18 for example are hydrogen or C1-­C18alkyl R20, R21, R22 and R23 i.a. are phenyl or C1-C18alkyl give high resolution with good resist profile. |
申请人 |
CIBA SPECIALTY CHEMICALS HOLDING INC.;MATSUMOTO, AKIRA;YAMATO, HITOSHI;ASAKURA, TOSHIKAGE;MURER, PETER |
发明人 |
MATSUMOTO, AKIRA;YAMATO, HITOSHI;ASAKURA, TOSHIKAGE;MURER, PETER |