| 摘要 |
On a surface of a bottom pole, a write gap film and first magnetic material film having a high saturation magnetic flux density are formed, and the first magnetic material film is etched to remain a portion extending from an air bearing surface to a throat height zero reference position and a first non-magnetic film is formed in a removed portion. The first non-magnetic material film is polished to obtain a flat surface which is coplanar with a surface of the first magnetic material film. A second magnetic material film having a high saturation magnetic flux density is formed on the flat surface. The second magnetic material film, first magnetic material film, write gap film and bottom pole are partially removed by RIE using a mask formed on the flat surface in accordance with a given pattern to form a track pole having a double-layer structure consisting of bottom and to track poles and a trim structure in a self-aligned manner. A second non-magnetic material film is formed in a space formed by the etching, and a surface of the second non-magnetic material film is polished to have a flat coplanar surface with the top track pole. A thin film coil is formed on the flat surface, and a top pole is formed such that one end is magnetically coupled with the top track pole and the other end is magnetically coupled with the first pole.
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