EDGE EXPOSURE WAFER SYSTEM OF FORCIBLE COOLING TYPE

摘要

PURPOSE: An edge exposure wafer system of a forcible cooling type is provided to control the heat of a lamp itself and extend the lifetime of the lamp by completely eliminating the heat of the edge exposure wafer system itself. CONSTITUTION: A wafer is placed on a chuck(11). A light source(19) is so installed to perform an exposure process on the edge of the wafer. A temperature sensor(27) detects a temperature. An exhaust pipe(23) exhausts the heat. A convection-type ventilator(25) is installed in the exhaust pipe to forcibly exhaust the air inside the edge exposure wafer system to the outside.