发明名称 Electroplating solution composition control
摘要 A method and apparatus for removing degraded organics from an electroplating solution by passing at least a portion of electroplating solution through a filter. The apparatus generally includes a deposition cell including a fluid inlet, a fluid reservoir, and at least one filter disposed between the reservoir and the fluid inlet. The apparatus may further include a control valve disposed between the fluid reservoir and the fluid inlet for passing at least a portion of an electroplating solution to a recovery stream including the at least one filter. Embodiments of the invention further include a method generally including the steps of providing a substrate having a seed layer disposed on a surface thereof, disposing the substrate in an electroplating solution, flowing a portion of the electroplating solution through a filter in an amount sufficient to remove an amount of organic additives from the electroplating solution equal to a calculated rate of organic additive degradation, and flowing the electroplating solution to the substrate.
申请公布号 US2003150734(A1) 申请公布日期 2003.08.14
申请号 US20020074489 申请日期 2002.02.11
申请人 APPLIED MATERIALS, INC. 发明人 BAJAJ RAJEEV;EMAMI RAMIN;DIXIT GIRISH;AJMERA HIRAL;MOSTOVOY ROMAN
分类号 C25D7/12;C25D21/18;H01L21/288;(IPC1-7):C25D21/06;C25D17/00;C25D21/16 主分类号 C25D7/12
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