| 摘要 |
<p>New polymers and new anti-reflective compositions containing such polymers are provided. The compositions comprise a polymer (e.g., epoxy cresol novolac resins) bonded with a chromophore (4-hydroxybenzoic acid, trimellitic anhydride). The inventive compositions can be applied to substrates (e.g., silicon wafers) to form antireflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.</p> |
