发明名称 ARTICLE FOR USE IN A SEMICONDUCTOR PROCESSING CHAMBER AND METHOD OF FABRICATING THE SAME
摘要 An article having a protective coating for use in semiconductor applications and method for making the same is provided. In one embodiment, a method of coating an aluminum surface of an article utilized in a semiconductor deposition chamber includes the steps of heating a coating material to a semi-liquidous state, the coating material comprising at least one material from the group consisting of aluminum fluoride and magnesium fluoride and depositing the heated coating material on the aluminum surface. The protective coating has a beta phase grain orientation of less than about 10 percent that has good adhesion to aluminum and resists cracking, flaking and peeling. Some articles that may be advantageously coated include showerheads, blocker plates, support assemblies and vacuum chamber bodies, among others.
申请公布号 WO03067634(A1) 申请公布日期 2003.08.14
申请号 WO2003US02616 申请日期 2003.01.29
申请人 APPLIED MATERIALS, INC. 发明人 LINGAMPALLI, RAMKISHAN, RAO
分类号 H01L21/3065;C23C4/00;C23C4/04;H01L21/205;H01L21/687;(IPC1-7):H01L21/00 主分类号 H01L21/3065
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