发明名称 |
Organic bottom antireflective coating for high performance mask making using optical imaging |
摘要 |
The disclosure pertains to a method of optically fabricating a photomask using a direct write continuous wave laser, comprising a series of steps including applying an organic antireflection coating over a chrome-containing layer; applying a chemically-amplified DUV photoresist over the organic antireflection coating; and exposing a surface of the DUV photoresist to the direct write continuous wave laser. The direct write continuous wave laser operates at a wavelength of 244 nm or 257 nm. In an alternative embodiment, the organic antireflection coating may be applied over an inorganic antireflection coating which overlies the chrome containing layer.
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申请公布号 |
US6605394(B2) |
申请公布日期 |
2003.08.12 |
申请号 |
US20010848859 |
申请日期 |
2001.05.03 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
MONTGOMERY MELVIN W.;ALBELO JEFFREY A |
分类号 |
G03F1/08;G03F7/09;(IPC1-7):G03F9/00;G03C5/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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