发明名称 Semiconductor laser, semiconductor device, and their manufacture methods
摘要 A substrate is made of SiC. A plurality of AlxGa1-xN patterns (0<=x<=1) is formed on a surface of the substrate and dispersively distributed in an in-plane of the substrate. An AlyGa1-yN buffer layer (0<=y<=1) covers the surface of the substrate and the AlxGa1-xN patterns. A laser structure is formed on the AlyGa1-yN buffer layer. Since the AlGaN buffer layer is grown by using the AlGaN patterns as seed crystals, a dislocation density of a predetermined region in the AlGaN buffer layer can be lowered. The characteristics of a laser structure can be improved by forming the laser structure above the region having a low dislocation density. Since the AlGaN pattern has electric conductivity, the device resistance can be suppressed from being increased.
申请公布号 US6606335(B1) 申请公布日期 2003.08.12
申请号 US20010743636 申请日期 2001.01.12
申请人 FUJITSU LIMITED 发明人 KURAMATA AKITO;HORINO KAZUHIKO
分类号 H01S5/02;H01S5/32;H01S5/323;(IPC1-7):H01S5/00 主分类号 H01S5/02
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