发明名称 Imageable photoresist laminate
摘要 A photosensitive laminate structure including a carrier layer and a photosensitive layer is described. The photosensitive layer includes a polymeric photosensitive resin composition containing at least one cross-linkable unit represented by the formula:wherein X is an organic moity and Y is selected from the following group:wherein Z is selected from at least one of lithium, sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, and tetraalkylammonium.
申请公布号 US6605406(B2) 申请公布日期 2003.08.12
申请号 US20010845037 申请日期 2001.04.27
申请人 THE CHROMALINE CORPORATION 发明人 JOHNSON KYLE;KOMATSU TOSHIFUMI;PETERSON JEREMY WILLIAM
分类号 G03F7/012;(IPC1-7):G03F7/012 主分类号 G03F7/012
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