发明名称 FUNCTIONAL THIN FILM FORMING APPARATUS AND FUNCTIONAL THIN FILM FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a functional thin film forming apparatus capable of forming a functional thin film to the surface of a substrate in uniform thickness. SOLUTION: The functional thin film forming apparatus is equipped with a coating device 1 for injecting a solution for forming the functional thin film from a nozzle by an ink jet system to apply the same to the surface of the substrate W, a baking device 2 for baking the solution applied to the surface of the substrate W by the coating device 1 and a scalar robot 3 for delivering the substrate W to the baking device from the coating device after the solution applied to the surface of the substrate W by the coating device is fluidized to become almost flat. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003225600(A) 申请公布日期 2003.08.12
申请号 JP20020027022 申请日期 2002.02.04
申请人 SHIBAURA MECHATRONICS CORP 发明人 YAMAZAKI TAKAHIRO;SHIGEYAMA AKIHIRO;TOYOSHIMA NORIO;MATSUSHIMA DAISUKE
分类号 B05D1/26;B05C5/00;B05C9/14;B05D3/02;(IPC1-7):B05C5/00 主分类号 B05D1/26
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