发明名称 |
FUNCTIONAL THIN FILM FORMING APPARATUS AND FUNCTIONAL THIN FILM FORMING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a functional thin film forming apparatus capable of forming a functional thin film to the surface of a substrate in uniform thickness. SOLUTION: The functional thin film forming apparatus is equipped with a coating device 1 for injecting a solution for forming the functional thin film from a nozzle by an ink jet system to apply the same to the surface of the substrate W, a baking device 2 for baking the solution applied to the surface of the substrate W by the coating device 1 and a scalar robot 3 for delivering the substrate W to the baking device from the coating device after the solution applied to the surface of the substrate W by the coating device is fluidized to become almost flat. COPYRIGHT: (C)2003,JPO
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申请公布号 |
JP2003225600(A) |
申请公布日期 |
2003.08.12 |
申请号 |
JP20020027022 |
申请日期 |
2002.02.04 |
申请人 |
SHIBAURA MECHATRONICS CORP |
发明人 |
YAMAZAKI TAKAHIRO;SHIGEYAMA AKIHIRO;TOYOSHIMA NORIO;MATSUSHIMA DAISUKE |
分类号 |
B05D1/26;B05C5/00;B05C9/14;B05D3/02;(IPC1-7):B05C5/00 |
主分类号 |
B05D1/26 |
代理机构 |
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主权项 |
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地址 |
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