| 摘要 |
<p>PROBLEM TO BE SOLVED: To suppress the increase in the time required for correction and data quantity and to suppress the cost of mask correction by limiting the parts where the correction is necessary. SOLUTION: Correction mask data and reference mask data are inputted 7-1. In some cases, the sizes of the correction mask patterns or reference mask patterns are corrected 7-2 and further, in some cases, the correction mask patterns or reference mask pattern are inverted 7-3. The reference mask patterns among the correction mask patterns or the parts of the reference mask patterns overlapping on the inversion patterns are drawn out. If the pattern area of the drawn out parts is below the specified area, the resizing to correct the pattern sizes is executed 7-5. If the pattern area of the drawn out parts is larger than the specified area, the parts is deleted 7-7. The patterns after the size correction are thereafter synthesized on the original correction mask patterns 7-8 and the mask patterns with which the correction ends are outputted 7-9.</p> |
