| 摘要 |
<p>PROBLEM TO BE SOLVED: To protect an inspection means, a substrate by setting a surface state inspection means for inspecting a surface state of the substrate in front of a defect inspection means spaced a minute distance from the substrate in an inspection direction and removing dust on the substrate based on the information. SOLUTION: A power source 5 is connected to a pixel electrode 7 of an active matrix substrate 23 and a thin film transparent electrode 24 of an electrooptic element 1. An electric field is applied between the electrodes 7 and 24 to change an optical state of the optical element 1. A light from a light source 2 is projected to the optical element 1, reflected at a gold vapor deposition film 26 at a bottom face, received at a photodetector 3, and photoelectrically converted. A state of the reflected light is observed by a monitor 4, an image of which is processed thereby to specify the presence/absence, state of defects of the matrix substrate 23. When a fixed device 9 moves in a horizontal direction 14, a sensor 13 detects when a dust 10 adheres to the matrix substrate 23 and sends the information to a control device 15. The control device 15 sends an operation command to a pressure air device 16 and a vacuum device 17, so that the dust 10 is removed from on the matrix substrate 23 by the pressure air device 16 and vacuum device 17.</p> |
