ANTI-MICROBIAL MONOMER, ANTI-MICROBIAL POLYMER USING THE SAME, AND MANUFACTURING METHOD THEREOF

摘要

PURPOSE: An anti-microbial monomer which has continuous anti-microbial activity and high heat resistance, an anti-microbial polymer using the same, and a manufacturing method thereof are provided. CONSTITUTION: An anti-microbial monomer represented by the formula 1 is provided, wherein R is polymerizable function group and photocurable function group containing C1 to C150 saturated or unsaturated carbohydrate; R1 and R2 are independently or simultaneously hydrogen, halogen atom, amine or C1-C20 alkyl; R3 and R4 are independently or simultaneously hydrogen, hydroxy, C1-C20 alcoholside, halogen atom or C1-C20 alkyl; R5 is hydrogen, C1-C20 alkyl, cyclopropyl or C1-C20 aromatic carbohydrate; R6 is hydrogen, sodium, potassium or polymerizable function group containing or noncontaining C1-C150 alkyl; R8, R9 and R10 are independently or simultaneously carbon or nitrogen; and R11 is hydrogen, amine(1", 2", 3"), halogen atom or C1-C20 alkyl. A manufacturing method of the anti-microbial monomer of the formula 1 comprises reacting a compound of the formula 2 with a compound of the formula 3:R-Z in the absence of solvent and base, wherein Z is halogen atom, or mesyl or tosyl containing leaving group.