| 摘要 |
PURPOSE: A method for cleaning insulating elements of an etch apparatus using a chloric compound is provided to remove easily contaminants and reduce a damage of an insulating element by using the chloric compound. CONSTITUTION: A boiling process is performed to boil an aqueous solution of a chloric compound including insulating elements of an etch apparatus. The insulating elements of the etch apparatus are picked up from the aqueous solution of the chloric compound. The insulating elements are cleaned by the ionized water. The insulating elements are dried. An outgassing process for the dried insulating elements is performed. The aqueous solution of the chloric compound has the chloric ion concentration of 2 or more percents. The chloric compound is formed with the compound of one or more materials selected from a group including Ca(ClO)2, NaOCI, and ClO2.
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