METHOD FOR MANUFACTURING MICROWAVE DEVICE

摘要

PURPOSE: A method for manufacturing a microwave device is provided to improve the characteristics of the microwave device by increasing a thickness of a device pattern through a metal plating method to improve the coupling effect. CONSTITUTION: A seed metal layer(32) is formed on an upper portion of a quartz substrate(31). A ground electrode(34) is formed on a lower surface of the quartz substrate(31). A photo-resist(PR) is applied on an upper portion of the seed metal layer(32). The upper portion of the seed metal layer(32) is exposed and developed. A pattern for exposing a part of the upper portion of the seed metal layer(32) is formed. A metal layer(33) is grown on the exposed seed metal layer(32) by using an electric plating method to be formed a required microwave device pattern. The photo-resist(PR) pattern and the seed metal layer(32) on the lower portion thereof are sequentially removed.