ETCHING APPARATUS

摘要

PURPOSE: An etching apparatus is provided to minimize the generation of particles by preventing the damage of a through-hole for reaction gas. CONSTITUTION: An etching apparatus includes a chamber, a gas supply portion(22), and a base material(26). The chamber is used for etching a processing target by using plasma. The gas supply portion is formed with a metallic material. The gas supply portion has a through-hole(24) to supply a reaction gas to the chamber. The base material is formed with a plastic material and arranged on a wall of the through-hole. The base material is used for preventing the damage of the wall of the through-hole. The metal material includes aluminum. The plastic material includes an engineering plastic material. The processing target is formed with a photoresist layer.