发明名称 COATING FILM FORMATION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a technique capable of stabilizing the discharge of a coating liquid and forming a coating film for which the intra-plane uniformity of film thickness is high at the time of supplying the coating liquid to a substrate, while moving a nozzle part to the left and right and forming the coating film on the surface of the substrate. <P>SOLUTION: The substrate is horizontally held by a substrate holding part freely movable in a Y direction (back and forth directions) and the nozzle facing the substrate and freely movable in the range of an X direction (left and right directions) corresponding to the coating liquid supply area of the substrate is provided above the substrate. A discharge port is formed at the lower end position of the nozzle, and a flow path connecting the discharge port and a coating liquid supply pipe connected to the upper end of the nozzle is formed in the inside. A liquid reservoir of a diameter larger than the one of the discharge part is formed in the middle of the flow path, and a filter member composed of a porous body is provided so as to interrupt the flow path in the inside. The filter member constitutes a pressure loss, and pulsations generated at the coating liquid supply pipe are absorbed at the part before reaching the discharge port. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003224066(A) 申请公布日期 2003.08.08
申请号 JP20020337095 申请日期 2002.11.20
申请人 TOKYO ELECTRON LTD 发明人 KITANO TAKAHIRO;KOGA NORIHISA;TAKEI TOSHICHIKA;KAWABUCHI YOSHIYUKI
分类号 G03F7/16;B05C11/08;B05C11/10;H01L21/027 主分类号 G03F7/16
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