SUBSTRATE SURFACE-CLEANING SOLUTION AND METHOD OF CLEANING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a substrate-cleaning solution that can efficiently remove particulate contamination in comparison with the existing techniques in the production process for semiconductor devices and display devices and provide a method of cleaning the same. SOLUTION: The substrate surface-cleaning solution includes at least the following components (A), (B), (C) and (D), has a pH of≥9, and has a content of the component (C) of 0.01-4 wt.%: (A) an ethylene oxide addition type surfactant having hydrocarbon groups which may be substituted as well as polyoxyethylene groups in the same molecular structure wherein the ratio (m/n) of the carbon atom number in the hydrocarbon groups (m) to the number of the oxyethylene groups (n) in the polyoxyethylene groups is≤1.5; (B) alkali components; (C) hydrogen peroxide; (D) water. COPYRIGHT: (C)2003,JPO