发明名称 SEMICONDUCTOR ALIGNER
摘要 PROBLEM TO BE SOLVED: To solve the problem of a semiconductor aligner that when a wafer warped upward through various processes is corrected planarly using an electrostatic chuck, peripheral part of the wafer is attracted first and since only the central part is left while being swollen by the frictional force acting between the wafer and the chuck, plane correction of the wafer cannot be performed. SOLUTION: When a deformed wafer is adsorbed to an electrostatic chuck, the wafer is previously applied with a force in the radial direction and forcibly deformed mechanically up to an approximately planar state and then the wafer is mounted, as it is, on the electrostatic chuck and adsorbed electrostatically thus correcting the wafer up to a specified planarity. As an example of forced deforming means, the wafer is placed on a carrying hand, clamped mechanically at a plurality of points at the outer circumferential end thereof and then applied with a force in the radial direction. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003224054(A) 申请公布日期 2003.08.08
申请号 JP20020020272 申请日期 2002.01.29
申请人 CANON INC 发明人 YONEKAWA MASAMI
分类号 G03F7/20;B65G49/07;H01L21/027;H01L21/677;H01L21/68;H01L21/683;(IPC1-7):H01L21/027 主分类号 G03F7/20
代理机构 代理人
主权项
地址