| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid crystal display element in which an insulating film such as a nitride film, a silicon film or the like for forming a contact hole can be etched minutely in a good tapered shape without depending upon the film type and film quality of the insulating film, and to provide a liquid crystal display device using the same. <P>SOLUTION: When an insulating film is dry-etched in order to form the contact hole in a gate electrode and a source/drain electrode on a transparent insultaing board, mixed gas containing a fluorine atom-containing gas and an oxygen gas as reactive gases and a mixing ratio (by volume) of the oxygen gas of 30 to 75% is used. Thus, since the highly minute and stable tapered shape can be assured, a problem of microminiaturization or a problem of yield due to a disconnection fault of a pixel electrode can be eliminated. <P>COPYRIGHT: (C)2003,JPO</p> |
