发明名称 EXPOSURE MASK, OPTICAL FIBER GRATING, MANUFACTURING METHOD THEREOF AND LIGHT AMPLIFIER MODULE
摘要 PROBLEM TO BE SOLVED: To provide an exposure mask for manufacturing an optical fiber grating having arbitrary loss wavelength characteristics without changing an amount of exposure of ultraviolet light to an optical fiber. SOLUTION: The stage number of the grating of the exposure mask is adjusted for manufacturing the optical fiber grating having desired loss wavelength characteristics in response to a wavelength. In other words, the wavelength needing large loss is set so that the stage number of the grating is large. Therefore, even when the amount of the exposure is uniform and the ultraviolet light is irradiated, the optical fiber grating obtaining the desired loss wavelength characteristics can be manufactured. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003222716(A) 申请公布日期 2003.08.08
申请号 JP20020024128 申请日期 2002.01.31
申请人 FUJIKURA LTD 发明人 AIZAWA TAKUYA;SAKAI TETSUYA
分类号 G02B5/18;G02B6/02;G02B6/10;H01S3/10;(IPC1-7):G02B5/18;G02B6/16 主分类号 G02B5/18
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