| 摘要 |
PROBLEM TO BE SOLVED: To obtain an aligner using EUV light, or the like, in which variation of EUV emission intensity due to temperature variation of a light source, or dimensional variation of a fine pattern and lowering of resolution incident thereto can be prevented while sustaining a long lifetime of a multilayer film mirror. SOLUTION: In the aligner employing a plasma emission light source, a shutter 101 is provided between the plasma emission light source 705 and an optical element (illumination system first mirror 706) in the first stage of an illumination system. A controller 102 closes the shutter 101 and starts emission of the plasma emission light source 705 in advance of starting exposure processing by a settling time, and starts exposure processing including the opening operation of the shutter 101 upon elapsing the settling time. The settling time is not shorter than the time required for settling emission intensity of the plasma emission light source 705 and it is measured previously and stored in the memory of the controller 102. COPYRIGHT: (C)2003,JPO
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