| 摘要 |
PROBLEM TO BE SOLVED: To form a fine pattern of uniform line width with high accuracy by reducing focus error caused by flexure of mask. SOLUTION: Using a mask Ri where partial patterns 161, 162 and 163 are formed by dividing a pattern being transferred to a sectional region set on a sensitive object into a plurality of regions, images of the partial patterns are sequentially transferred by exposure onto the sensitive object while adjusting the relative position between each partial pattern and the sensitive object such that the images of respective partial patterns are joined together on the sensitive object. COPYRIGHT: (C)2003,JPO
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