发明名称 SURFACE TREATMENT METHOD
摘要 PROBLEM TO BE SOLVED: To provide a surface treatment method which can surely eliminate residue by only treatment using supercritical fluid. SOLUTION: In the surface treatment method wherein a surface on which a structure is formed is treated by the supercritical fluid 4, ammonium hydroxide, alkanolamine, amine fluoride, hydrofluoric acid, etc., are added as solubilizer 5 to the supercritical fluid 4. A surfactant 6 may be added to the supercritical fluid 4 together with a solubilizer 5. A polar solvent may be used as the surfactant 6. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003224099(A) 申请公布日期 2003.08.08
申请号 JP20020021097 申请日期 2002.01.30
申请人 SONY CORP 发明人 SAGA KOICHIRO
分类号 B81C99/00;B81B3/00;B81C1/00;C11D7/08;C11D7/32;C11D7/50;C11D11/00;G03F1/00;G03F7/42;H01L21/304;H01L21/306;H01L21/308;(IPC1-7):H01L21/304;B81C5/00 主分类号 B81C99/00
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