| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent unnecessary pattern transfer generated when irradiation of reflection light from the stage of an exposure system is added to necessary direct irradiation when a photosensitive resin is exposed. <P>SOLUTION: A reflection function film for uniformly reflecting light from the exposure system is disposed at a place where such a film is needed before the photosensitive resin is formed. Thereby, the photosensitive resin can be formed uniformly in a shape regardless of the surface state of the exposure system and the unnecessary pattern transfer depending on the stage of the exposure system can be prevented. <P>COPYRIGHT: (C)2003,JPO |
