| 摘要 |
PROBLEM TO BE SOLVED: To provide a system for processing a substrate in which the component of a chemical filter having a power for removing chemical contaminants can be utilized effectively. SOLUTION: A reaction furnace having a function for processing a substrate heated by means of a heater 10 in an inner tube 12 is contained in a housing 16 and a chemical filter section 11 is provided in the passage of air flowing into the air inlet 17 of the housing 16 from the outside. In such a system for processing a substrate, the chemical filter section 11 comprises chemical filters stacked in a plurality of stages, two stages of 11-1 and 11-2 in fig. 1. At the time of replacing the chemical filter, the outermost chemical filter 11-1 is taken out, the chemical filter 11-2 is shifted to the position where the chemical filter 11-1 had been located, and then a new chemical filter is inserted to a position where the innermost chemical filter 11-2 had been located. COPYRIGHT: (C)2003,JPO
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