发明名称 METHOD OF JOINING A WORKPIECE AND A MICROSTRUCTURE BY LIGHT EXPOSURE
摘要 <p>A method of joining a workpiece and a microstructure by light exposure, a microstructure obtainable by the method comprising a workpiece joined thereto, means thereto and use thereof; in particular a microstructure-forming composition comprising a light-sensitive, structure-forming material comprising one or more photo resist materials which are sensitive to preferably UV-light, and a light-absorbing material comprising one or more light-absorbing substances absorbing preferably IR light and being in an amount sufficient to produce heat upon exposure to said absorbed light; a microstructure-forming preparation comprising such composition; a method of producing a microstructure on a substrate; and a microstructure obtainable by the method; a method of joining a workpiece and a microstructure, a microstructure obtainable by the method comprising a workpiece joined thereto, e.g. for producing closed micro flow channels in a micro flow system; and use of such a microstructure, e.g. in lab-on-chip applications, in point-of-care systems, in high-through-put screening systems, preferably in systems for screening active compounds in fluids, in particular biological fluids.</p>
申请公布号 WO2003065122(P1) 申请公布日期 2003.08.07
申请号 DK2003000062 申请日期 2003.01.31
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