| 摘要 |
<p>A liquid detergent for semiconductor device substrates which comprises the following ingredients (A), (B), and (C); and a method of cleaning with the detergent. Ingredient (A): an ethylene oxide type surfactant which comprises a hydrocarbon group optionally having a substituent (excluding phenyl) and a polyoxyethylene group, and in which the ratio of the number of carbon atoms in the hydrocarbon group (m) to that of oxyethylene groups in the polyoxyethylene group (n), m/n, is from 1 to 1.5, the number of the carbon atoms (m) is 9 or larger, and the number of the oxyethylene groups (n) is 7 or larger. Ingredient (B): water. Ingredient (C): an alkali or an organic acid. By cleaning with the detergent, fine particles or organic pollutants adherent to a substrate surface are removed without corroding the substrate surface. Thus, the substrate surface is cleaned to a high degree.</p> |
