METHOD FOR FORMING TRANSPARENT THIN FILM, TRANSPARENT THIN FILM FORMED BY THE METHOD AND TRANSPARENT SUBSTRATE WITH TRANSPARENT THIN FILM

摘要

A method for forming a transparent thin film by the chemical vapor phase growth method using a gaseous raw material ,which comprises forming a transparent thin film comprising at least one element selected from carbon (C) and oxygen (O), nitrogen (N), hydrogen (H), and silicon (Si) at a film forming speed of 8 nm/s or more. The method allows the formation of a transparent thin film which is less prone to exfoliation from a substrate due to the relaxation of the tensile stress therein and exhibits high transmissivity in the region of visible lights on a glass ribbon in a float bath.