发明名称 SEMICONDUCTOR LASER ELEMENT AND METHOD FOR PRODUCING SUCH A SEMICONDUCTOR LASER ELEMENT
摘要 The invention relates to a semiconductor laser element that comprises a first semiconductor layer system (102, 103), produced on a substrate (101) by epitaxial growth, of a first material that has a lattice constant that is different from the lattice constant of the substrate. A quantification layer (104) that has a higher lattice constant than the lattice constant of the first semiconductor is produced on the first semiconductor material by epitaxial growth in such a manner that a quantification effect is produced in the quantification layer (104) that suppresses or strongly inhibits the diffusion of the charged particles. A second semiconductor layer system (105, 106, 107) is produced on the quantification layer by epitaxial growth. Nothing to translate
申请公布号 WO0243120(A3) 申请公布日期 2003.08.07
申请号 WO2001DE04395 申请日期 2001.11.22
申请人 INFINEON TECHNOLOGIES AG;RIECHERT, HENNING 发明人 RIECHERT, HENNING
分类号 H01S5/02;H01S5/32;H01S5/323 主分类号 H01S5/02
代理机构 代理人
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