| 摘要 |
<p>The invention relates to a method and arrangement for deposition of a black coating on a substrate (48). The arrangement comprises: - a sealed housing (10) with an inert gas atmosphere, two cathodic atomisation sources (18H, 18B) arranged with one to face the interior of said housing and the other facing the substrate (48), respectively provided with a titanium target (30H) and an aluminium target (30B), supply means for a continuous electric voltage source (38), means for introducing nitrogen (40H, 42H) and oxygen (40B-42B) into the chamber between the sources and the substrate and means for setting the substrate in rotation (44, 50) such as to expose the above to each source alternately.</p> |
