发明名称 Method of using photolithography and etching for forming a nozzle plate of an inkjet print head
摘要 A method of forming a nozzle plate of an inkjet print head. A silicon chip is provided with an activated device and a first film is formed on the silicon chip, with a first opening corresponding to the activated device. Then, a second film is formed on the first film. Next, a photoresist layer is formed on the second film, such that the photoresist layer has a second opening corresponding to the first opening. Next, the second film under the second opening of the photoresist layer is etched to form a via in the second film passing through the first opening.
申请公布号 US2003145464(A1) 申请公布日期 2003.08.07
申请号 US20030348630 申请日期 2003.01.22
申请人 LINLIU KUNG;YANG MING-HSUN;YANG ARNOLD CHANG-MOU;CHEN GUEY-CHYUAN;HSU CHIH-CHIEH 发明人 LINLIU KUNG;YANG MING-HSUN;YANG ARNOLD CHANG-MOU;CHEN GUEY-CHYUAN;HSU CHIH-CHIEH
分类号 B41J2/16;(IPC1-7):B23P17/00;B21D53/76 主分类号 B41J2/16
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