发明名称 WAVEFRONT ABERRATION AND CORNEAL TOPOGRAPHY MEASUREMENT
摘要 <p>A method and apparatus for measuring with a single device both the aberrations introduced by an eye (102) and the topography of the cornea of the eye. The method includes determining aberrations within a wavefront created by reflecting a beam off the retina of an eye, determining the corneal topography of the eye from a pattern reflected by the cornea, and directing the beam, wavefront and reflected pattern using a combiner/separator. The apparatus (90) includes a source (106) for generating the beam (104) for producing the wavefront (114) exiting the eye and a first imaging device (118) for receiving the wavefront to determine aberrations, a projector (133) for projecting the pattern (148) onto the cornea (116) for reflection by the cornea and a second imaging device (150) for receiving the reflected pattern to determine corneal topography, and a combiner/separator (154) for directing the beam, wavefront, and reflected pattern.</p>
申请公布号 WO2003063695(P1) 申请公布日期 2003.08.07
申请号 US2003000382 申请日期 2003.01.08
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